GET READY FOR LED PRODUCTION ON 8 INCH

We offer production systems for deposition of metals, dielectrics  and TCOs using  either evaporation or sputter.   BAK batch evaporators can be optimised for substrate sizes up to 8 inch  including the  new Auotoload cassette to cassette sytem for elimination of manual wafer handling.  EBS 500 E Gun technology  enables accurate deposition for active, barrier or contact layers  and the addition of PDS plasma source technology enables further reduction of process temperatures or process times . 

Evatec's Radiance cluster tool offers multiple process technologies on a single platform  ( PVD, RTP, RIE, PECVD, ICP etch) also including  proven LED processes for up to 8 inch.   Evatec sputter  know enables  DBR stacks with  customised broadband reflection and  perfect ohmic contacts for GaN(p)   whilst ICP etch offers high performance patterning of sapphire .