For critical optical applications demanding even higher film densities and optical stabilities or where we have temperature sensitive substrates, we offer enhanced technologies.

The PDS Plasma Deposition Source is used for assisted evaporation processes our range of BAK box coaters and is available for both new systems or as retrofit.

The MSP Sputter System is a high throughput batch sputter system with 4 vertically mounted cathodes achieving deposition uniformities better than 1% and supreme optical, mechanical and environmental stabilities. Typical deposition materials include the oxides of niobium, titanium, tantalum and silicon.

The BAP801 is a dedicated Ion Plating System which opens up even more possibilities to the device designer in controlling complex film properties such as internal stress.

Please contact your local Sales and Service Office to discuss your individual needs.