Evatec offers high uniformity etch capability within  its "Radiance" and  "BAK"  platforms. 

Classical fixed ion sources are available in a range of sizes according to size of  BAK platform  whilst linear sources which move into position during the etch step offer highest etch uniformity in the most demanding processes for 8 inch wafers.  In addition, Evatec's proprietary PDS plasma source is tailored specifically to PIAD processes in optics and optoelectronics on the BAK platform.

With its cluster architecture, the Radiance platform can be configured for RIE and High Density Plasma etch processes including Microwave, DECR and ICP in collaboration with partner company Corial SAS