The addition of a plasma source to the coating chamber in evaporation processes provides a highly energetic plasma into the evaporation plume of electron beam or other thermal sources. The resultant films have improved density, mechanical and optical properties.

The PDS is robust stand alone source for Plasma Ion Assisted Deposition (PIAD) processes in precision optics . Specifically designed for high rates and capable of supporting high throughput systems up to 1.5m diameter, its easy to install, operate and maintain in both new systems and as a retrofit.