PECVD

Evatec offers  high performance PECVD technology integrated within its Radiance cluster tool platform in partnership with Corial SAS. Reactor design enables high uniformity,  pinhole free films with high breakdown voltages, tuneable refractive index and control of film stress from tensile to compressive according to process requirements.  In situ plasma cleaning  means that the  manual cleaning necessary for conventional reactors  is eliminated giving Corial's reactors the highest reactor uptimes and efficiencies.

 

Typical performance data PECVD processes [click image to enlarge]

PECVD reactors integrated within Evatec Radiance or stand alone

Compact reactor design

Tuneable film stress