SOLARIS® S151- 8 inch processing at up to 1200 substrates per hour

Designed for flexible or rigid substrate sizes up to 8 inch for typical applications including Touch Screen, Solar Cells and OLEDS, the SOLARIS® S151 offers sputter, heating / annealing and CVD technology on a single platform.


  • Up to 6 process stations for RTP, PVD, Etch or CVD
  • Direct substrate handling or carriers for mini batches with no compromise in process quality -Easy integration into automated fab lines


  • Quick change over from one substrate size to another with carrier system
  • Carrier loading / unloading included in the machine design
  • Small foot print and low operating costs
  • Flexible configurations allowed - each process station is separated from the other
  • Multi layer capability – each chamber can operate different processes and deposit different materials
  • Multi Source Sputtering – alloy development with up to 4 different materials
  • Substrate rotation during sputtering ensures layer uniformity better than ±2%
  • Max. coated area up to 225mm diameter
  • Film annealing with heater up to 550°C
  • Surface cleaning and activation by etching
  • Easy integration into fab automation
  • Target and shield change time max. 30min